Thermo Scientific

X-Ray Fluorescence (XRF) is a powerful quantitative and qualitative tool ideally suited to the analysis of film thickness and composition, determination of elemental concentration by weight of solids and solutions, and identification of specific and trace elements in complex samples matrices. XRF analysis is used extensively in almost all industries, including semiconductors, telecommunications and microelectronics, metal finishing and refining.

MicronX System GXR

The System GXR employs mechanical collimation and a gas proportional detector and can be upgraded to include an optical collimator or an electrically cooled semiconductor detector. The optimized beam column yields higher precision and faster measurements than conventional tools. When outfitted with the optically collimated Transmission ElementTM, the GXR precisely measures Sn, Pd, and Ag structures as small as 25 microns and Au and Ni structures as small as 35 microns

MicronX System VXR

The System VXR utilizes vacuum technology and a sophisticated Joule-Thompson cooled semiconductor (140eV, FWHM) to achieve an extended elemental measurable range of Al to U. The VXR is an excellent choice for measurement of deposition thickness and composition where elements such as Al, Si, and P are present.

MicronX System CXR

The System CXR platform is a configurable, console based, microbeam XRF (MXRF) film thickness and composition measuring tool. It combines the power, precision, and applications flexibility of the bench-top System XR platform with a vibration free, floor-standing design that can be docked to a complete range of SECS/GEM compatible automated sample handling options. CXR is a non-contact, non-destructive metrology tool ideally suited to the thin film measurement needs of the micro-electronics, semiconductor, telecommunications, and data storage industries.