M420 Series – Stepper

M420 Series of Excimer Laser Stepper Systems

Tamarack Scientific has been producing leading-edge industrial laser ablation tools since 1988. The 6th Generation of Tamarack’s M420 Series of excimer laser stepper systems raises the bar for high performance ablation tools.  These systems are engineered for higher throughput while significantly reducing the cost of ownership when measured against competitive systems.

Tamarack’s mask-based excimer laser ablation systems have the largest field of view in the industry, with the ability to process single sites up to 100mm in diameter. The M420 Series is specifically designed for high throughput, 24/7 micromachining operations involving micron-sized features that require the highest degree of placement accuracy.

M420Each system in the M420 Series offers “Dual Mode Versatility” for function as both an ablation and a photolithography exposure system.  The M420 features a wide choice of low to high-power excimer lasers of varying wavelengths, while also allowing customers to choose between three stage platforms for processing substrates of any shape up to 750x1000mm.   The M420’s intuitive, flexible control system enables highly customized process automation, and a variety of automatic loading options ensure optimal throughput for your application.

Key features and benefits of the M420 Series include:

  • resolution to 2µm
  • sub-micron alignment accuracy
  • high-throughput processing
  • largest FOV in the industry (Ø 100mm) improves throughput by reducing overheads and enabling the creation of large non-repeated patterns
  • large DOF for thick material processing with high aspect ratios
  • robotic wafer/substrate loading from FOUP, cassette or conveyor
  • dynamic beam measurement and control to ensure accurate execution of stringent process parameters
  • available wavelengths of 248nm or 308nm utilizing the broadest range of excimer lasers in the market
  • configurable processing methods which allow for step & repeat, step & scan and continuous scanning to match process requirements
  • automated mask loading and mask library
  • available manual load option for small batch runs or research applications
  • SECS/GEMM

To discuss your application in strict confidentiality, please contact one of our sales engineers.